When:
Friday, February 12, 2016
11:30 AM - 12:30 PM CT
Where: Cook Hall, MSE Conference Room, 2058, 2220 Campus Drive, Evanston, IL 60208 map it
Audience: Faculty/Staff - Student - Public - Post Docs/Docs - Graduate Students
Contact:
Raymond Givens Bailey
(847) 467-3144
Group: NUANCE Center
Category: Lectures & Meetings
Presentation and Demos by Andrey Ivankin
TERA-Fab M-Series
The TERA-FAB M Series is the first commercial tool for doing Polymer Pen Lithography (PPL) - This tool provides the user with the ability to pattern surfaces with materials over square centimeter areas. A wide variety of inks and substrates can be used, and arrays with as many as 160,000 pens are available. This tool is extremely useful for making the types of architectures traditionally made by contact printing or by dip pen nanolithography, but it does not require a new stamp each time a new pattern is generated. Researchers can generate features across the nanometer, micrometer, and macroscopic length scales all with the same tool. Custom software allows one to generate any pattern of interest. Applications involve the generation of electronic circuitry, combinatorial libraries of hard and soft matter (e.g. DNA, proteins, carbohydrates, inorganic nano particles), and affinity templates that can localize nanoscopic structures at predefined locations on surfaces.
TERA-Fab E-Series
The TERA-FAB E series is the first commercial tool for doing Beam Pen Lithography (BPL). This instrument uses arrays with as many 20,000 independently addressable pens, each with a tiny aperture to pattern surfaces with light. The custom software allows the researcher to rapidly stitch fields together over a 0.5x0.4 cm2 patterning area. Feature size resolution is sub-100 nm. This tool allows one to rapidly prototype electronic and optical devices, fabricate photomasks, and lithographically process photosensitive surfaces at the point-of-use. A clean room is not required.
Refreshments will be provided.